File:Partially etched silicon dioxide via Nomarski DIC.jpg

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current21:48, 27 September 2009Thumbnail for version as of 21:48, 27 September 20092,113 × 1,550 (755 KB)commons>Richstraka~commonswiki{{Information |Description={{en|1=The subject of this image is a silicon integrated circuit wafer in the region between two circuit die. The oxide should have been fully etched in the horizontal area at the center of the image, but in fact was not - becau

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