File:OpcedPhotomask.png

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Date/TimeThumbnailDimensionsUserComment
current18:50, 11 February 2011Thumbnail for version as of 18:50, 11 February 20112,079 × 2,077 (40 KB)commons>LithoGuy{{Information |Description ={{en|1=A realistic photomask. It is obtained by taking a polygon layout we desire to have on the wafer, adding to it assist features, and applying en:optical proximity correction.}} |Source ={{own}} |Author

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